Resume：
General Manager of Flat Panel Display Business Division，Shanghai Micro Electronics Equipment (Group) Co., Ltd. (SMEE)
Speech theme:
Keep Improving, the Innovation and Development Road of Domestic FPD Lithography Equipment
Speech summary:
Over the years, SMEE has been constantly innovating and forging ahead, constantly developing and expanding the domestic FPD litho. equipment. Adhering to the spirit of excellence, the resolution is from 2μm to 1.5μm, and then to 1.2μm; The plate size is from G2.5 to G4.5, then to G6 and G8. The technologies become more and more precisely and complexly. But two domestic series of lithography equipment with independent intellectual property rights have been developed. Among them, the small mask series litho. equipment adopts the original magnification objective lens and precise stitching exposure technology, which has the characteristics of high accuracy and low cost; Large mask series litho. equipment adopts innovative optical and mechanical technologies, with high transmittance and large exposure field. Domestic lithography equipment are helping the development of China's FPD industry and will become more important in the future.